EUV photolithography: resist progress and challenges
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EUV photolithography: resist progress and challenges
With the rapid development of semiconductors, today's optical lithography is approaching its physical limits, and thus alternative patterning technology is urgently desired. Extreme ultra-violet (EUV) lithography, using a wavelength of 13.5 nm, is considered one of the most prominent candidates for next generation lithography. The main ...
Mar 19, 2018
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